Please use this identifier to cite or link to this item: https://doi.org/10.1063/1.4757938
Title: Influence of target composition and deposition temperature on the domain structure of BiFeO3 thin films
Authors: Guo, R.
You, L.
Motapothula, M.
Zhang, Z.
Breese, M.B.H. 
Chen, L.
Wu, D.
Wang, J.
Issue Date: 2012
Citation: Guo, R., You, L., Motapothula, M., Zhang, Z., Breese, M.B.H., Chen, L., Wu, D., Wang, J. (2012). Influence of target composition and deposition temperature on the domain structure of BiFeO3 thin films. AIP Advances 2 (4) : -. ScholarBank@NUS Repository. https://doi.org/10.1063/1.4757938
Abstract: Domain structure of BiFeO3 thin films can be controlled by adjusting the target composition or the substrate temperature during pulsed laser deposition. Decreasing Bi content in the target or increasing substrate temperature changes the domain structure of BiFeO3 from 71° to 109°. We suggest that a combination of interface effect and defect induced internal field causes this evolution. © 2012 Copyright 2012 Author(s). This article is distributed under a Creative Commons Attribution 3.0 Unported License.
Source Title: AIP Advances
URI: http://scholarbank.nus.edu.sg/handle/10635/96923
ISSN: 21583226
DOI: 10.1063/1.4757938
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