Please use this identifier to cite or link to this item: http://scholarbank.nus.edu.sg/handle/10635/96789
Title: High quality ion-induced secondary electron imaging for MeV nuclear microprobe applications
Authors: Teo, E.J. 
Breese, M.B.H. 
Bettiol, A.A. 
Watt, F. 
Alves, L.C.
Issue Date: Mar-2004
Source: Teo, E.J.,Breese, M.B.H.,Bettiol, A.A.,Watt, F.,Alves, L.C. (2004-03). High quality ion-induced secondary electron imaging for MeV nuclear microprobe applications. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures 22 (2) : 560-564. ScholarBank@NUS Repository.
Abstract: The use of solid state Cockroft-Walton type accelerator to produce high quality secondary electron image was discussed. The study was carried out by using a voltage-modulated dc signal imaging process. A pattern SiGe sample was used to determine the optimum signal-to-noise ratio that can achieved by minimizing the beam fluctuation and increasing the signal intensity. The results show that the intensity of the beam current was varied by changing the size of the microprobe collimator slits to keep all the accelerator parameter constant.
Source Title: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
URI: http://scholarbank.nus.edu.sg/handle/10635/96789
ISSN: 10711023
Appears in Collections:Staff Publications

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