Please use this identifier to cite or link to this item: https://doi.org/10.1063/1.3623567
DC FieldValue
dc.titleGraphene on β-Si 3N 4: An ideal system for graphene-based electronics
dc.contributor.authorYang, M.
dc.contributor.authorZhang, C.
dc.contributor.authorWang, S.
dc.contributor.authorFeng, Y.
dc.contributor.authorAriando
dc.date.accessioned2014-10-16T09:26:57Z
dc.date.available2014-10-16T09:26:57Z
dc.date.issued2011
dc.identifier.citationYang, M., Zhang, C., Wang, S., Feng, Y., Ariando (2011). Graphene on β-Si 3N 4: An ideal system for graphene-based electronics. AIP Advances 1 (3) : -. ScholarBank@NUS Repository. https://doi.org/10.1063/1.3623567
dc.identifier.issn21583226
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/96736
dc.description.abstractOne of the most severe limits in future design of graphene-based electronic devices is that when supported on a substrate, the electron mobility of graphene is often reduced by an order of magnitude or more. In this paper, via theoretical calculations, we show that the non-polar -Si 3N 4 (0001) surface may be an excellent support for both single-layer or bi-layer graphene to overcome this limit. Since the high- dielectric material is an indispensable component in integrated circuits, the silicon nitride supported graphene as discussed in this paper may provide an ideal platform for future graphene-based electronics. © 2011 Author(s).
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1063/1.3623567
dc.sourceScopus
dc.typeArticle
dc.contributor.departmentPHYSICS
dc.description.doi10.1063/1.3623567
dc.description.sourcetitleAIP Advances
dc.description.volume1
dc.description.issue3
dc.description.page-
dc.identifier.isiut000302139600011
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