Please use this identifier to cite or link to this item:
|Title:||Fabrication of TiN thin film by shadow-masked pulsed laser deposition|
|Citation:||Chen, C., Ong, P.P., Wang, H. (2001-02-01). Fabrication of TiN thin film by shadow-masked pulsed laser deposition. Thin Solid Films 382 (1-2) : 275-279. ScholarBank@NUS Repository. https://doi.org/10.1016/S0040-6090(00)01694-1|
|Abstract:||A shadow-masked pulsed laser deposition (SPLD) technique has been used to fabricate TiN thin film on a silicon substrate. By interposing a chosen mask of the appropriate size and location between the laser-induced plasma plume and the substrate, it was possible to vary the quality and smoothness of the resultant film. While all the films produced by shadow-masking represent a marked improvement over the conventional pulsed laser deposition (PLD) technique, it was also observed that the masking caused a considerable reduction in the deposition rate. The nearer the shadow mask was to the substrate the greater the film quality produced but the lesser the deposition rate. From X-ray diffraction analyses of the thin films it was found that an important reason for the surface defects of those films produced by the unmasked PLD method was the existence of multiple orientations of the different crystal domains. The SPLD technique reduced the occurrence of such multiple orientations and improved crystal alignment direction by preventing lumpy clusters originating from the laser ablation from reaching the substrate.|
|Source Title:||Thin Solid Films|
|Appears in Collections:||Staff Publications|
Show full item record
Files in This Item:
There are no files associated with this item.
checked on Jan 23, 2019
WEB OF SCIENCETM
checked on Jan 7, 2019
checked on Jan 11, 2019
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.