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|Title:||Fabrication of large-area patterned porous silicon distributed Bragg reflectors|
|Authors:||Mangaiyarkarasi, D. |
|Citation:||Mangaiyarkarasi, D.,Ow, Y.S.,Breese, M.B.H.,Fuh, V.L.S.,Eric, T.X. (2008-08-18). Fabrication of large-area patterned porous silicon distributed Bragg reflectors. Optics Express 16 (17) : 12757-12803. ScholarBank@NUS Repository.|
|Abstract:||A process to fabricate porous silicon Bragg reflectors patterned on a micrometer lateral scale over wafer areas of several square centimeters is described. This process is based on a new type of projection system involving a megavolt accelerator and a quadrupole lens system to project a uniform distribution of MeV ions over a wafer surface, which is coated with a multilevel mask. In conjunction with electrochemical anodisation, this enables the rapid production of high-density arrays of a variety of optical and photonic components in silicon such as waveguides and optical microcavities for applications in high-definition reflective displays and optical communications. © 2008 Optical Society of America.|
|Source Title:||Optics Express|
|Appears in Collections:||Staff Publications|
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