Please use this identifier to cite or link to this item: https://doi.org/10.1063/1.1773933
Title: Fabrication of high aspect ratio 100 nm metallic stamps for nanoimprint lithography using proton beam writing
Authors: Ansari, K. 
Van Kan, J.A. 
Bettiol, A.A. 
Watt, F. 
Issue Date: 19-Jul-2004
Citation: Ansari, K., Van Kan, J.A., Bettiol, A.A., Watt, F. (2004-07-19). Fabrication of high aspect ratio 100 nm metallic stamps for nanoimprint lithography using proton beam writing. Applied Physics Letters 85 (3) : 476-478. ScholarBank@NUS Repository. https://doi.org/10.1063/1.1773933
Abstract: The fabrication method of high-quality void-free high aspect ratio 100 nm metallic stamps for nanoimprint lithography using proton beam writing (PBW) was discussed. Nanoimprinting was carried out with a commercial nanoimprinter using 8-μm-thick poly(methymethacrylate) (PMMA) resist in anisole double spin coated on Cu(200 nm)/Ti(20 nm)/Si substrate. It was suggested that PBW coupled with electroplating offers a process of high potential for the fabrication of high quality metallic 3D nanostamps. It was also suggested that since proton beam writing exhibits minimal proximity effects, it is ideally suited to produce features of high packing density.
Source Title: Applied Physics Letters
URI: http://scholarbank.nus.edu.sg/handle/10635/96594
ISSN: 00036951
DOI: 10.1063/1.1773933
Appears in Collections:Staff Publications

Show full item record
Files in This Item:
There are no files associated with this item.

SCOPUSTM   
Citations

97
checked on Oct 15, 2018

WEB OF SCIENCETM
Citations

94
checked on Oct 15, 2018

Page view(s)

60
checked on Oct 12, 2018

Google ScholarTM

Check

Altmetric


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.