Please use this identifier to cite or link to this item: https://doi.org/10.1364/OL.34.003142
Title: Effects of oxide formation around core circumference of silicon-on-oxidized-porous-silicon strip waveguides
Authors: Teo, E.J. 
Xiong, B.Q.
Ow, Y.S. 
Breese, M.B.H. 
Bettiol, A.A. 
Issue Date: 15-Oct-2009
Source: Teo, E.J., Xiong, B.Q., Ow, Y.S., Breese, M.B.H., Bettiol, A.A. (2009-10-15). Effects of oxide formation around core circumference of silicon-on-oxidized-porous-silicon strip waveguides. Optics Letters 34 (20) : 3142-3144. ScholarBank@NUS Repository. https://doi.org/10.1364/OL.34.003142
Abstract: We have studied the effect of oxidation on the propagation loss and surface roughness of silicon-on-oxidizedporous-silicon strip waveguides fabricated using proton-beam irradiation and electrochemical etching. A thin thermal oxide is formed around the core of the waveguide, enabling the symmetric reduction of core size and roughness on all sides. Significant loss reduction from about 10 dB/cm to 1 dB/cm has been obtained in TE and TM polarizations after oxidation smoothening of both the bottom and the sidewalls by 20 nm. This corresponds well with simulations using the beam-propagation method that show significant contributions from both surfaces. © 2009 Optical Society of America.
Source Title: Optics Letters
URI: http://scholarbank.nus.edu.sg/handle/10635/96372
ISSN: 01469592
DOI: 10.1364/OL.34.003142
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