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|Title:||Effects of oxide formation around core circumference of silicon-on-oxidized-porous-silicon strip waveguides|
|Authors:||Teo, E.J. |
|Citation:||Teo, E.J., Xiong, B.Q., Ow, Y.S., Breese, M.B.H., Bettiol, A.A. (2009-10-15). Effects of oxide formation around core circumference of silicon-on-oxidized-porous-silicon strip waveguides. Optics Letters 34 (20) : 3142-3144. ScholarBank@NUS Repository. https://doi.org/10.1364/OL.34.003142|
|Abstract:||We have studied the effect of oxidation on the propagation loss and surface roughness of silicon-on-oxidizedporous-silicon strip waveguides fabricated using proton-beam irradiation and electrochemical etching. A thin thermal oxide is formed around the core of the waveguide, enabling the symmetric reduction of core size and roughness on all sides. Significant loss reduction from about 10 dB/cm to 1 dB/cm has been obtained in TE and TM polarizations after oxidation smoothening of both the bottom and the sidewalls by 20 nm. This corresponds well with simulations using the beam-propagation method that show significant contributions from both surfaces. © 2009 Optical Society of America.|
|Source Title:||Optics Letters|
|Appears in Collections:||Staff Publications|
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