Please use this identifier to cite or link to this item: http://scholarbank.nus.edu.sg/handle/10635/96199
Title: Determination of some physical parameters from infrared reflectance spectra
Authors: Kok, W.C. 
Issue Date: 1992
Citation: Kok, W.C. (1992). Determination of some physical parameters from infrared reflectance spectra. Applied Surface Science 60-61 (C) : 559-564. ScholarBank@NUS Repository.
Abstract: An expression is derived for the spectral variation of the normal-incidence reflectance of a diffused semiconductor wafer. Based on this approximate analytical form, a method is proposed for the determination of some physical parameters of doped semiconductors. For illustrative purposes, the method is applied to a phosphorus-diffused silicon sample where the IR reflectance data and diffusion profile are both available. © 1992.
Source Title: Applied Surface Science
URI: http://scholarbank.nus.edu.sg/handle/10635/96199
ISSN: 01694332
Appears in Collections:Staff Publications

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