Please use this identifier to cite or link to this item: http://scholarbank.nus.edu.sg/handle/10635/95968
Title: Characterization of surface microroughness of silicon wafers by a multipass Fabry-Perot Rayleigh-Brillouin scattering spectrometer
Authors: Taijing, L. 
Ng, S.C. 
Furukawa, J.
Furuya, H.
Issue Date: Apr-1996
Citation: Taijing, L.,Ng, S.C.,Furukawa, J.,Furuya, H. (1996-04). Characterization of surface microroughness of silicon wafers by a multipass Fabry-Perot Rayleigh-Brillouin scattering spectrometer. Journal of Materials Research 11 (4) : 878-883. ScholarBank@NUS Repository.
Abstract: Surface microroughness of various Si(100) wafers was detected and characterized by a 180° backscattering Rayleigh-Brillouin scattering spectrometer (RBSS), and measured by an atomic force microscopy (AFM). The intensity of the scattered light from the wafers is found to increase with increasing surface microroughness which was measured by AFM. By scanning across the wafer, the inhomogeneous distribution of surface microroughness is detected and characterized. The system can be easily developed into a mapping technique. The results of the surface microroughness detected by AFM and RBSS suggest that they are complementary for the characterization of the surface microroughness from a microarea to a whole wafer.
Source Title: Journal of Materials Research
URI: http://scholarbank.nus.edu.sg/handle/10635/95968
ISSN: 08842914
Appears in Collections:Staff Publications

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