Please use this identifier to cite or link to this item: https://doi.org/10.1149/1.1407833
Title: In Situ Electrochemical ATR-FTIR Spectroscopic Investigation of Hydrogen-Terminated Si(110) Surface in Dilute NH 4F Solution
Authors: Wang, Y. 
Li, S.F.Y. 
Ye, J.H.
Issue Date: Nov-2001
Citation: Wang, Y., Li, S.F.Y., Ye, J.H. (2001-11). In Situ Electrochemical ATR-FTIR Spectroscopic Investigation of Hydrogen-Terminated Si(110) Surface in Dilute NH 4F Solution. Journal of the Electrochemical Society 148 (11) : E439-E443. ScholarBank@NUS Repository. https://doi.org/10.1149/1.1407833
Abstract: In situ electrochemical attenuated total reflection Fourier transform infrared (ATR-FTIR) spectroscopy has been employed to study the dependence of hydride structures on a Si(110) surface in dilute NH 4F solution. In situ ATR-FTIR results show that the Si(110) surface remains H-terminated in dilute NH 4F solution and the hydride on Si(110) has a strong interaction with water molecules under cathodic potential control. In addition. SiHO 3 is formed even at cathodic potentials. Infrared roughness factors, defined as the ratio of monohydride at steps or dihydride over the monohydride on the (110) plane, suggest that monohydride-terminated (111) facets are the dominant defects on the Si(110) surface in dilute NH 4F solution at cathodic electrode potential. At anodic potential, vertical dihydrides, besides (111) facets, increased on the Si(110) surface leading to a roughened morphology. © 2001 The Electrochemical Society. All rights reserved.
Source Title: Journal of the Electrochemical Society
URI: http://scholarbank.nus.edu.sg/handle/10635/94018
ISSN: 00134651
DOI: 10.1149/1.1407833
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