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|Title:||Deposition of osmium and ruthenium thin films from organometallic cluster precursors|
|Source:||Li, C., Leong, W.K., Loh, K.P. (2009-05). Deposition of osmium and ruthenium thin films from organometallic cluster precursors. Applied Organometallic Chemistry 23 (5) : 196-199. ScholarBank@NUS Repository. https://doi.org/10.1002/aoc.1494|
|Abstract:||Single-source organometallic precursors based on a number of homometallic clusters as well as heterometallic cluster RuOs3(CO)M 13(μ-H)2 have been used for the chemical vapor deposition of osmium films and osmium-ruthenium alloy films, respectively. © 2009 John Wiley & Sons, Ltd.|
|Source Title:||Applied Organometallic Chemistry|
|Appears in Collections:||Staff Publications|
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