Please use this identifier to cite or link to this item: https://doi.org/10.1002/aoc.1494
Title: Deposition of osmium and ruthenium thin films from organometallic cluster precursors
Authors: Li, C.
Leong, W.K. 
Loh, K.P. 
Keywords: Alloy
Cluster
CVD
Osmium
Ruthenium
Issue Date: May-2009
Source: Li, C., Leong, W.K., Loh, K.P. (2009-05). Deposition of osmium and ruthenium thin films from organometallic cluster precursors. Applied Organometallic Chemistry 23 (5) : 196-199. ScholarBank@NUS Repository. https://doi.org/10.1002/aoc.1494
Abstract: Single-source organometallic precursors based on a number of homometallic clusters as well as heterometallic cluster RuOs3(CO)M 13(μ-H)2 have been used for the chemical vapor deposition of osmium films and osmium-ruthenium alloy films, respectively. © 2009 John Wiley & Sons, Ltd.
Source Title: Applied Organometallic Chemistry
URI: http://scholarbank.nus.edu.sg/handle/10635/93531
ISSN: 02682605
DOI: 10.1002/aoc.1494
Appears in Collections:Staff Publications

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