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|Title:||Generation of Double-Layer Steps on (010) Surface of Orthorhombic MoO3 via Chemical Etching at Room Temperature|
|Source:||Hsu, Z.Y.,Zeng, H.C. (2000-12-21). Generation of Double-Layer Steps on (010) Surface of Orthorhombic MoO3 via Chemical Etching at Room Temperature. Journal of Physical Chemistry B 104 (50) : 11891-11898. ScholarBank@NUS Repository.|
|Abstract:||Using the methods of atomic force microscopy, X-ray diffraction and Fourier transform infrared spectroscopy, chemical etching of the (010) surface of flux-grown orthorhombic MoO3 (α-MoO3) single crystals has been investigated in detail. The (010) surface was etched repeatedly in a 0.08 M NaOH aqueous solution, and its topographies were recorded to reveal the evolution patterns upon the etching time. It is found that the "molecular steps" at a height of a single double-layer of MoO3 (6.9 Å, or 1/2 bo) can be generated on the surface of (010) in the basic solution. A ̊layer-by-layer̊ etching mechanism proposed previously has been confirmed in this model catalyst fabrication. The observed etch pit volumes and multiple-step formation have also been addressed. Although they are created at room temperature, the surface steps/edges are chemically and thermally stable in a common operating temperature range of 350-400°C. The fabrication/modification of future catalysts via chemical etching is anticipated, since surface steps/edges are expected to be active sites in many heterogeneous catalytic reactions. © 2000 American Chemical Society.|
|Source Title:||Journal of Physical Chemistry B|
|Appears in Collections:||Staff Publications|
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