Please use this identifier to cite or link to this item: https://doi.org/10.1007/BF00357824
Title: Reactive deposition of ultrafine cobalt powders - Part I Electrochemical investigation
Authors: Cui, C.Q. 
Tseung, A.C.C.
Issue Date: Jan-1993
Citation: Cui, C.Q., Tseung, A.C.C. (1993-01). Reactive deposition of ultrafine cobalt powders - Part I Electrochemical investigation. Journal of Materials Science 28 (2) : 461-468. ScholarBank@NUS Repository. https://doi.org/10.1007/BF00357824
Abstract: During the reactive deposition of cobalt powders, Co(OH)2 colloidal layers are formed at the electrode surface; the individual cobalt crystals are isolated by the Co(OH)2 colloid around the grain boundaries so that their growth is inhibited and ultrafine cobalt crystal grains are formed, which are loosely attached to the titanium substrate. The existence of Co(OH)2 colloid layer at the electrode surface depresses the hydrogen evolution reaction in the deposition process and accelerates the decrease of the interfacial Co2+ concentration. Therefore, compared to the normal deposition of cobalt powders, it has several unique advantages: (1) ultrafine cobalt powders (0.4-0.6 μm) can be produced; (2) the amount of Co(OH)2 in the powders is decreased; (3) there is a wider range of current density for the formation of cobalt powders. © 1993 Chapman & Hall.
Source Title: Journal of Materials Science
URI: http://scholarbank.nus.edu.sg/handle/10635/91668
ISSN: 00222461
DOI: 10.1007/BF00357824
Appears in Collections:Staff Publications

Show full item record
Files in This Item:
There are no files associated with this item.

SCOPUSTM   
Citations

2
checked on Jul 17, 2018

WEB OF SCIENCETM
Citations

2
checked on Jun 26, 2018

Page view(s)

43
checked on May 25, 2018

Google ScholarTM

Check

Altmetric


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.