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|Title:||Corrosion protection of copper by a self-assembled monolayer of alkanethiol|
|Citation:||Feng, Y.,Teo, W.-K.,Siow, K.-S.,Gao, Z.,Tan, K.-L.,Hsieh, A.-K. (1997-01). Corrosion protection of copper by a self-assembled monolayer of alkanethiol. Journal of the Electrochemical Society 144 (1) : 55-64. ScholarBank@NUS Repository.|
|Abstract:||A self-assembled monolayer of 1-dodecanethiol (DT) was formed on a copper surface pretreated using different methods. The corrosion protection abilities of the monolayer were evaluated in an air-saturated 0.51 M NaCl solution using various techniques including electrochemical impedance spectroscopy, polarization, coulometry, weight loss, and x-ray photoelectron spectroscopy. It was found that the corrosion resistance of the monolayer was improved markedly by using a nitric acid etching method. A minimum concentration of 10-4 M DT was needed to form a protective monolayer. The DT-monolayer retarded the reduction of dissolved oxygen and inhibited the growth of copper oxide in the NaCl solution. In comparison with other inhibitors, such as benzotriazole (BTA) and mercapto-benzothiazole (MBT), the DT-monolayer showed much better corrosion resistance in aqueous solution.|
|Source Title:||Journal of the Electrochemical Society|
|Appears in Collections:||Staff Publications|
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