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|Title:||Bimodal distribution of damage morphology generated by ion implantation|
|Citation:||Mok, K.R.C., Jaraiz, M., Martin-Bragado, I., Rubio, J.E., Castrillo, P., Pinacho, R., Srinivasan, M.P., Benistant, F. (2005-12-05). Bimodal distribution of damage morphology generated by ion implantation. Materials Science and Engineering B: Solid-State Materials for Advanced Technology 124-125 (SUPPL.) : 389-391. ScholarBank@NUS Repository. https://doi.org/10.1016/j.mseb.2005.08.099|
|Abstract:||A nucleation and evolution model of damage based on amorphous pockets (APs) has recently been developed and implemented in an atomistic kinetic Monte Carlo simulator. In the model, APs are disordered structures (InV m), which are agglomerates of interstitials (I) and vacancies (V). This model has been used to study the composition and size distribution of APs during different ion implantations. Depending strongly on the dose rate, ion mass and implant temperature, the APs can evolve to a defect population where the agglomerates have a similar number of I and V (n ≈ m), or to a defect population with pure I (m ≈ 0) and pure V (n ≈ 0) clusters, or a mixture of APs and clusters. This behaviour corresponds to a bimodal (APs/clusters) distribution of damage. As the AP have different thermal stability compared to the I and V clusters, the same damage concentration obtained through different implant conditions has a different damage morphology and, consequently, exhibit a different resistance to subsequent thermal treatments. © 2005 Elsevier B.V. All rights reserved.|
|Source Title:||Materials Science and Engineering B: Solid-State Materials for Advanced Technology|
|Appears in Collections:||Staff Publications|
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