Please use this identifier to cite or link to this item: https://doi.org/10.1021/ie070478c
Title: Photocatalytic treatment of wastewater contaminated with organic waste and copper ions from the semiconductor industry
Authors: Zou, S.-W. 
How, C.-W.
Chen, J.P. 
Issue Date: 26-Sep-2007
Citation: Zou, S.-W., How, C.-W., Chen, J.P. (2007-09-26). Photocatalytic treatment of wastewater contaminated with organic waste and copper ions from the semiconductor industry. Industrial and Engineering Chemistry Research 46 (20) : 6566-6571. ScholarBank@NUS Repository. https://doi.org/10.1021/ie070478c
Abstract: Simultaneous decontamination of organic compounds and copper ions in the wastewater discharged from semiconductor manufacturing facilities by a UV/TiO2 photocatalytic degradation was investigated in this study. Two organic compounds of ethyl lactate and phenol and copper ions were studied due to their common applications in various wafer fabrication processes and higher toxicities. The optimal TiO2 dosage and initial pH for the photocatalytic oxidation of ethyl lactate and phenol were 0.1 g/L and 3.0-4.0. Photocatalytic degradation under these optimal conditions was able to simultaneously mineralize those solvents and remove copper(II) in the synthetic wastewater. Under anoxic condition, oxygen inhibited copper reduction and copper(II) ions were removed through precipitation. Under anaerobic conditions, the removal rate of copper(II) ions and the rate of reduction of the organic solvents content were lower than that in the aerobic condition. © 2007 American Chemical Society.
Source Title: Industrial and Engineering Chemistry Research
URI: http://scholarbank.nus.edu.sg/handle/10635/87589
ISSN: 08885885
DOI: 10.1021/ie070478c
Appears in Collections:Staff Publications

Show full item record
Files in This Item:
There are no files associated with this item.

SCOPUSTM   
Citations

21
checked on May 21, 2018

WEB OF SCIENCETM
Citations

18
checked on May 21, 2018

Page view(s)

34
checked on May 18, 2018

Google ScholarTM

Check

Altmetric


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.