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|Title:||Growth mechanism and optical properties of In2O3 nanorods synthesized on ZnO/GaAs (1 1 1) substrate|
|Keywords:||A3. Physical vapor deposition processes|
B2. Semiconductor indium compounds
|Citation:||Liu, H.F., Hu, G.X., Gong, H. (2009-01-01). Growth mechanism and optical properties of In2O3 nanorods synthesized on ZnO/GaAs (1 1 1) substrate. Journal of Crystal Growth 311 (2) : 268-271. ScholarBank@NUS Repository. https://doi.org/10.1016/j.jcrysgro.2008.10.062|
|Abstract:||Indium oxide (In2O3) nanorods have been grown on a ZnO-buffered GaAs (1 1 1) substrate by radio-frequency magnetron sputtering at a substrate temperature of 350 °C. The growth directly on a GaAs (1 1 1) substrate under the same conditions results in In2O3:In nanoclusters rather than in In2O3 nanorods, and an increase in the oxygen pressure leads to a dense In2O3 thin film with grain sizes smaller than 50 nm. The influence of the ZnO buffer layer on the synthesis of the In2O3 nanorods is associated with the presence of three-dimensional defects on the surface via the formation of Zn(/In) eutectics. Photoluminescence emissions are observed from the grown In2O3 nanorods and thin films at room temperature, and the optical bandgap of In2O3 is determined to be ∼3.66 eV. © 2008 Elsevier B.V. All rights reserved.|
|Source Title:||Journal of Crystal Growth|
|Appears in Collections:||Staff Publications|
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