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|Title:||Effects and thermal stability of hydrogen microwave plasma treatment on tetrahedral amorphous carbon films by in situ ultraviolet photoelectron spectroscopy|
|Authors:||Chua, D.H.C. |
|Citation:||Chua, D.H.C., Hsieh, J., Gao, X., Qi, D., Chen, S., Varghese, B., Sow, C.H., Wee, A.T.S., Lu, J., Loh, K.P., Yu, X., Moser, H.O. (2009). Effects and thermal stability of hydrogen microwave plasma treatment on tetrahedral amorphous carbon films by in situ ultraviolet photoelectron spectroscopy. Journal of Applied Physics 106 (2) : -. ScholarBank@NUS Repository. https://doi.org/10.1063/1.3156689|
|Abstract:||This paper reports a comprehensive experimental study on the effects of hydrogen microwave plasma treatment on nonhydrogenated high s p3 content tetrahedral amorphous carbon (ta-C) film. In this study, a surface C-H dipole layer was first observed by high resolution electron energy loss spectroscopy, showing the presence of C-H bonding states. This resulted in the enhancement of electron field emission of the plasma treated films by largely lowering the turn-on field. Thermal stability tests using in situ ultraviolet photoelectron spectroscopy confirm that the C-H dipole layer not only reduces the work function of the films, it is extremely stable in both ambient and vacuum conditions and can sustain up to 600 °C annealing in vacuum. Atomic force microscopy studies also show minimal modifications to the surface morphology, leading to the conclusion that the C-H dipole layer is responsible for lowering the work function. This has improved the electron emission properties which can lead to potential applications such as electron emission displays. © 2009 American Institute of Physics.|
|Source Title:||Journal of Applied Physics|
|Appears in Collections:||Staff Publications|
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