Please use this identifier to cite or link to this item: https://doi.org/10.1063/1.3079510
Title: Effect of residual stress on the ferroelectric property of (Pb0.90 La0.10) Ti0.975 O3 thin films
Authors: Wu, J. 
Xiao, D.
Zhu, J.
Issue Date: 2009
Citation: Wu, J., Xiao, D., Zhu, J. (2009). Effect of residual stress on the ferroelectric property of (Pb0.90 La0.10) Ti0.975 O3 thin films. Journal of Applied Physics 105 (5) : -. ScholarBank@NUS Repository. https://doi.org/10.1063/1.3079510
Abstract: Highly (001)-, (100)-, (101)-, and (110)-oriented (Pb0.90 La0.10) Ti0.975 O3 (PLT) thin films were deposited on the LaNiO3 (001) /Pt (111) /Ti/ SiO2 /Si (100), LaNiO3 / SiO2 /Si (100), PbTiO3 / Pt (111) /Ti/ SiO2 /Si (100), and LaNiO3 (110) /Pt (111) /Ti/ SiO2 /Si (100) substrates by rf magnetron sputtering. The orientation dependence of ferroelectric properties of the PLT films was investigated. The result shows that the (001)-oriented PLT thin films exhibit enhanced ferroelectric properties (2 Pr =61.1 μC/ cm2 and 2 Ec =179 kV/cm). The residual stress of the PLT thin films with different orientations was measured by x-ray diffraction (sin2 ψ method) for illuminating the related physical mechanisms. The result shows that the enhanced ferroelectric properties of (001)-oriented PLT thin films should be attributed to low residual stress. © 2009 American Institute of Physics.
Source Title: Journal of Applied Physics
URI: http://scholarbank.nus.edu.sg/handle/10635/86271
ISSN: 00218979
DOI: 10.1063/1.3079510
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