Please use this identifier to cite or link to this item: https://doi.org/10.1088/0031-8949/2010/T139/014004
Title: Characterization of La-doped (Ba0.85 Sn0.15) TiO 3 thin films grown by pulsed laser deposition
Authors: Wang, S.J.
Song, W.D.
Lai, M.O. 
Lu, L. 
Issue Date: 2010
Citation: Wang, S.J., Song, W.D., Lai, M.O., Lu, L. (2010). Characterization of La-doped (Ba0.85 Sn0.15) TiO 3 thin films grown by pulsed laser deposition. Physica Scripta T T139 : -. ScholarBank@NUS Repository. https://doi.org/10.1088/0031-8949/2010/T139/014004
Abstract: In the present study, 1 mol.% La-doped Ba(Ti0.85Sn 0.15)O3 (BLaTS) thin films have been deposited on LaNiO3 (LNO)/SiO2 /Si substrates by PLD. X-ray diffraction analyses revealed that the films grow with a highly (h00) textured orientation. Higher crystallization quality was obtained at higher deposition temperatures. FE-SEM cross-sectional images and the SIMS test both confirm the sharp interface between as-deposited BLaTS thin films and the bottom LNO layers. The XPS measurement results indicated that La showed a pure +3 valence. The lower loss tangent in the low frequency range is attributed to the reduction in oxygen vacancies caused by La doping. The pyroelectric results showed that BLaTS thin films are suitable candidates for thermal applications. © 2010 The Royal Swedish Academy of Sciences.
Source Title: Physica Scripta T
URI: http://scholarbank.nus.edu.sg/handle/10635/85898
ISSN: 02811847
DOI: 10.1088/0031-8949/2010/T139/014004
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