Please use this identifier to cite or link to this item: https://doi.org/10.1016/j.cplett.2004.07.060
Title: Preparation of mesoporous silica films using sol-gel process and argon plasma treatment
Authors: Palaniappan, A.
Zhang, J.
Su, X.
Tay, F.E.H. 
Issue Date: 1-Sep-2004
Citation: Palaniappan, A., Zhang, J., Su, X., Tay, F.E.H. (2004-09-01). Preparation of mesoporous silica films using sol-gel process and argon plasma treatment. Chemical Physics Letters 395 (1-3) : 70-74. ScholarBank@NUS Repository. https://doi.org/10.1016/j.cplett.2004.07.060
Abstract: This Letter demonstrates the first attempt of using sol-gel technique in combination with argon plasma calcination for the preparation of mesoporous silica films. CTAB is used as an organic template to generate the porous structure upon removal by the argon plasma treatment. Field emission scanning electron microscope, Fourier transform infrared spectroscopy, small angle X-ray scattering, N 2-sorption experiment and nanoindentation technique are used for characterization. Results show that the obtained films have identical chemical structure and comparable mechanical properties with those prepared using thermal calcination. The plasma parameters have distinct influences on the thickness and mesoporous property of the films. © 2004 Elsevier B.V. All rights reserved.
Source Title: Chemical Physics Letters
URI: http://scholarbank.nus.edu.sg/handle/10635/85567
ISSN: 00092614
DOI: 10.1016/j.cplett.2004.07.060
Appears in Collections:Staff Publications

Show full item record
Files in This Item:
There are no files associated with this item.

SCOPUSTM   
Citations

9
checked on Jun 16, 2018

WEB OF SCIENCETM
Citations

8
checked on May 8, 2018

Page view(s)

22
checked on May 25, 2018

Google ScholarTM

Check

Altmetric


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.