Please use this identifier to cite or link to this item:
Title: Microfabricated hollow microneedle array using ICP etcher
Authors: Ji, J.
Tay, F.E.H. 
Miao, J.
Issue Date: 1-Apr-2006
Source: Ji, J.,Tay, F.E.H.,Miao, J. (2006-04-01). Microfabricated hollow microneedle array using ICP etcher. Journal of Physics: Conference Series 34 (1) : 1132-1136. ScholarBank@NUS Repository.
Abstract: This paper presents a developed process for fabrication of hollow silicon microneedle arrays. The inner hollow hole and the fluidic reservoir are fabricated in deep reactive ion etching. The profile of outside needles is achieved by the developed fabrication process, which combined isotropic etching and anisotropic etching with inductively coupled plasma (ICP) etcher. Using the combination of SF6/O2 isotropic etching chemistry and Bosch process, the high aspect ratio 3D and high density microneedle arrays are fabricated. The generated needle external geometry can be controlled by etching variables in the isotropic and anisotropic cases. © 2006 IOP Publishing Ltd.
Source Title: Journal of Physics: Conference Series
ISSN: 17426588
DOI: 1/187
Appears in Collections:Staff Publications

Show full item record
Files in This Item:
There are no files associated with this item.

Page view(s)

checked on Feb 23, 2018

Google ScholarTM



Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.