Please use this identifier to cite or link to this item: https://doi.org/10.1142/S0217979210064198
Title: Measurement of the hardness of ultra-thin films by the first derivative of load-displacement curve from nanoindentation data
Authors: Kumar, A.
Zeng, K. 
Keywords: Hardness
Nanoindentation
Thin films
Issue Date: 20-Jan-2010
Citation: Kumar, A., Zeng, K. (2010-01-20). Measurement of the hardness of ultra-thin films by the first derivative of load-displacement curve from nanoindentation data. International Journal of Modern Physics B 24 (1-2) : 256-266. ScholarBank@NUS Repository. https://doi.org/10.1142/S0217979210064198
Abstract: The commonly-used nanoindentation experiments for measuring hardness of thin films may not give the accurate results when the thickness of the film is in the range of few hundred nanometers or less due to the unavoidable substrate effects. The available analysis methods usually work well when the indentation depth is less than one tenth of the total thickness of the film; otherwise, it is very difficult to determine the film-only properties without substrate effects. This work proposes an alternative analysis to measure the hardness of ultra-thin film from nanoindentation data. This method is tested for numbers of bulk materials and the results agreed well with literature reported values; the method is then applied to thin films. It is found that this analysis can give very accurate results for different kind of film-substrate systems such as soft-films on hard-substrate and hard-film on soft-substrate. As the proposed method is based on the measurement of hardness at each indentation step therefore, it is also capable to show at what indentation depth the substrate starts affecting the indentation-measured hardness values. © World Scientific Publishing Company.
Source Title: International Journal of Modern Physics B
URI: http://scholarbank.nus.edu.sg/handle/10635/85379
ISSN: 02179792
DOI: 10.1142/S0217979210064198
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