Please use this identifier to cite or link to this item: https://doi.org/10.1016/j.jmmm.2004.07.044
Title: Exchange bias and magnetization process of Co/CoO nanocomposite thin films
Authors: Yi, J.B. 
Ding, J. 
Liu, B.H. 
Dong, Z.L.
White, T.
Liu, Y.
Keywords: Asymmetric reversal
CoO/Co nanocomposite
Exchange bias
Extraordinary Hall effect
Magnetoresistance
Issue Date: Jan-2005
Citation: Yi, J.B., Ding, J., Liu, B.H., Dong, Z.L., White, T., Liu, Y. (2005-01). Exchange bias and magnetization process of Co/CoO nanocomposite thin films. Journal of Magnetism and Magnetic Materials 285 (1-2) : 224-232. ScholarBank@NUS Repository. https://doi.org/10.1016/j.jmmm.2004.07.044
Abstract: Co/CoO nanocomposite thin films have been deposited by RF sputtering with different oxygen partial pressures in the working atmosphere. It has been found that the magnetic properties (exchange bias (EB), coercivity and remanence) of the films are strongly dependent on the oxygen partial pressure. Film deposited with an O2 pressure of 0.75 × 10-5Torr shows a relatively high coercivity and high remanence ratio. Enhanced asymmetry of magnetization reversal appears in the film deposited with 1.5 & 10 -5Torr O2 partial pressure. When the O2 partial pressure is increased to 3.0 & 10-5Torr, a strong reduction in EB and coercivity have been obtained. The investigation of the microstructure using high-resolution transmission electron microscope reveals that the change in EB, remanence and coercivity is probably related to the competition between dipolar interaction and exchange coupling. Magnetoresistance and extraordinary Hall effect (EHE) of the Co/CoO nanocomposite films is also investigated in dependence on oxygen partial pressure. The film deposited under 2.3 × 10-5Torr of oxygen exhibits strongly enhanced asymmetric magnetization reversal and unusually high EHE with a high coercivity. © 2004 Elsevier B.V. All rights reserved.
Source Title: Journal of Magnetism and Magnetic Materials
URI: http://scholarbank.nus.edu.sg/handle/10635/85169
ISSN: 03048853
DOI: 10.1016/j.jmmm.2004.07.044
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