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|Title:||Direct nanoimprint lithography of Al 2O 3 using a chelated monomer-based precursor|
|Citation:||Ganesan, R., Dinachali, S.S., Lim, S.H., Saifullah, M.S.M., Chong, W.T., Lim, A.H.H., Yong, J.J., Thian, E.S., He, C., Low, H.Y. (2012-08-10). Direct nanoimprint lithography of Al 2O 3 using a chelated monomer-based precursor. Nanotechnology 23 (31) : -. ScholarBank@NUS Repository. https://doi.org/10.1088/0957-4484/23/31/315304|
|Abstract:||Nanostructuring of Al 2O 3 is predominantly achieved by the anodization of aluminum film and is limited to obtaining porous anodized aluminum oxide (AAO). One of the main restrictions in developing approaches for direct fabrication of various types of Al 2O 3 patterns, such as lines, pillars, holes, etc, is the lack of a processable aluminum-containing resist. In this paper, we demonstrate a stable precursor prepared by reacting aluminum tri-sec-butoxide with 2-(methacryloyloxy)ethyl acetoacetate, a chelating monomer, which can be used for large area direct nanoimprint lithography of Al 2O 3. Chelation in the precursor makes it stable against hydrolysis whilst the presence of a reactive methacrylate group renders it polymerizable. The precursor was mixed with a cross-linker and their in situ thermal free-radical co-polymerization during nanoimprinting rigidly shaped the patterns, trapped the metal atoms, reduced the surface energy and strengthened the structures, thereby giving a 100% yield after demolding. The imprinted structures were heat-treated, leading to the loss of organics and their subsequent shrinkage. Amorphous Al 2O 3 patterns with line-widths as small as 17nm were obtained. Our process utilizes the advantages of sol-gel and methacrylate routes for imprinting and at the same time alleviates the disadvantages associated with both these methods. With these benefits, the chelating monomer route may be the harbinger of the universal scheme for direct nanoimprinting of metal oxides. © 2012 IOP Publishing Ltd.|
|Appears in Collections:||Staff Publications|
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