Please use this identifier to cite or link to this item: https://doi.org/10.1002/pssb.200405210
Title: Raman scattering studies in two kinds of Ge nanosystems under hydrostatic pressure
Authors: Teo, K.L. 
Shen, Z.X. 
Liu, L. 
Kolobov, A.V.
Maeda, Y.
Issue Date: Nov-2004
Citation: Teo, K.L., Shen, Z.X., Liu, L., Kolobov, A.V., Maeda, Y. (2004-11). Raman scattering studies in two kinds of Ge nanosystems under hydrostatic pressure. Physica Status Solidi (B) Basic Research 241 (14) : 3269-3273. ScholarBank@NUS Repository. https://doi.org/10.1002/pssb.200405210
Abstract: We report Raman scattering of Ge nanocrystals (NCs) embedded in SiO 2 matrix on Si substrate (Ge/SiO2/Si) and on quartz substrate (Ge/SiO2/quartz) under hydrostatic pressure. The pressure coefficient obtained for the Ge mode in the Ge/SiO2/quartz nanosystem is found to be almost twice as large compared with its corresponding bulk value. We explained our results using a simple elastic model, which describes the effective pressure transmitted from the matrix to the NCs. In Ge/SiO2/Si nanosystem, delamination of the SiO2film from the Si substrate occurs at ∼23 kbar due to the large difference between the compressibility of the SiO2 matrix and Si substrate. The observed effect can be understood by the nonhomogeneous distribution of the elastic field in the Ge/SiO2/Si nanosystem using a finite element analysis. © 2004 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
Source Title: Physica Status Solidi (B) Basic Research
URI: http://scholarbank.nus.edu.sg/handle/10635/84122
ISSN: 03701972
DOI: 10.1002/pssb.200405210
Appears in Collections:Staff Publications

Show full item record
Files in This Item:
There are no files associated with this item.

SCOPUSTM   
Citations

2
checked on Dec 18, 2018

WEB OF SCIENCETM
Citations

3
checked on Dec 18, 2018

Page view(s)

28
checked on Mar 12, 2018

Google ScholarTM

Check

Altmetric


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.