Please use this identifier to cite or link to this item: https://doi.org/10.1117/12.456817
Title: Pulsed laser deposition of carbon nitride materials
Authors: Ren, Z.M.
Lu, Y.F. 
He, Z.F.
Keywords: β-C3N4
Carbon nitride
Ion-assisted
Laser ablation
Thin films
Issue Date: 2002
Source: Ren, Z.M., Lu, Y.F., He, Z.F. (2002). Pulsed laser deposition of carbon nitride materials. Proceedings of SPIE - The International Society for Optical Engineering 4426 : 210-216. ScholarBank@NUS Repository. https://doi.org/10.1117/12.456817
Abstract: Synthesis of carbon nitride has been an important topic in materials science since 1993. Ion-assisted pulsed laser deposition is proven to be a good method to deposit carbon nitride thin films. Both amorphous and crystal β-C3N4 layers can be deposited on many substrates. A standard experimental set-up comprises a pulsed KrF excimer laser (wavelength 248 nm, duration ∼30 ns) that is used to ablate the graphite target and a nitrogen ion beam bombarding simultaneously on the substrate. A variety of experimental derivatives have been developed based on pulsed laser deposition. The deposited thin films have been characterized by Auger Electron Spectroscope (AES), X-ray Photoelectron Spectroscopy (XPS), Mass Time of Flight spectrum (TOF), Optical Emission Spectrum (OES), Rutherford Backscattering (RBS), High Energy Backscattering (HEBS), Raman spectroscopy, Fourier Transform Infra-red Spectroscopy (FTIR), Ellipsometry, Electron Diffraction, Scanning Tunnelling Microscope (STM) and Atomic force microscope (AFM). Investigations are carried out to identify the binding structure, nitrogen content, electronic properties, optical properties and crystal structures of the deposited thin films.
Source Title: Proceedings of SPIE - The International Society for Optical Engineering
URI: http://scholarbank.nus.edu.sg/handle/10635/84118
ISSN: 0277786X
DOI: 10.1117/12.456817
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