Please use this identifier to cite or link to this item:
https://doi.org/10.1109/IEDM.2008.4796836
DC Field | Value | |
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dc.title | Nanowire FETs for Low Power CMOS Applications Featuring Novel Gate-All-Around Single Metal FUSI Gates with Dual φ m and v T Tune-ability | |
dc.contributor.author | Jiang, Y. | |
dc.contributor.author | Liow, T.Y. | |
dc.contributor.author | Singh, N. | |
dc.contributor.author | Tan, L.H. | |
dc.contributor.author | Lo, G.Q. | |
dc.contributor.author | Chan, D.S.H. | |
dc.contributor.author | Kwong, D.L. | |
dc.date.accessioned | 2014-10-07T04:47:38Z | |
dc.date.available | 2014-10-07T04:47:38Z | |
dc.date.issued | 2008 | |
dc.identifier.citation | Jiang, Y.,Liow, T.Y.,Singh, N.,Tan, L.H.,Lo, G.Q.,Chan, D.S.H.,Kwong, D.L. (2008). Nanowire FETs for Low Power CMOS Applications Featuring Novel Gate-All-Around Single Metal FUSI Gates with Dual φ m and v T Tune-ability. Technical Digest - International Electron Devices Meeting, IEDM : -. ScholarBank@NUS Repository. <a href="https://doi.org/10.1109/IEDM.2008.4796836" target="_blank">https://doi.org/10.1109/IEDM.2008.4796836</a> | |
dc.identifier.isbn | 9781424423781 | |
dc.identifier.issn | 01631918 | |
dc.identifier.uri | http://scholarbank.nus.edu.sg/handle/10635/84000 | |
dc.description.abstract | A simple and cost-effective single metal gate scheme was successfully demonstrated to form gate-all-around (GAA) nanowire FETs with optimized dual V T for low power CMOS applications. FUSI gate-induced stress effects were shown to be of great relevance to device performance. At an I off of 20 pA/μm, superior I on of 1180 and 405 μA/μm were obtained for NFETs and PFETs at a V DD of 1.2 V. | |
dc.description.uri | http://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1109/IEDM.2008.4796836 | |
dc.source | Scopus | |
dc.type | Conference Paper | |
dc.contributor.department | ELECTRICAL & COMPUTER ENGINEERING | |
dc.description.doi | 10.1109/IEDM.2008.4796836 | |
dc.description.sourcetitle | Technical Digest - International Electron Devices Meeting, IEDM | |
dc.description.page | - | |
dc.description.coden | TDIMD | |
dc.identifier.isiut | NOT_IN_WOS | |
Appears in Collections: | Staff Publications |
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