Please use this identifier to cite or link to this item: https://doi.org/10.1142/S0219581X10006867
Title: Nanoscale arrays in lithium niobate fabricated by interference lithography and dry etching
Authors: Si, G.Y.
Danner, A.J. 
Teng, J.H.
Ang, S.S.
Chew, A.B.
Dogheche, E.
Keywords: interference lithography
LiNbO3 dense arrays
plasma etching
Issue Date: Aug-2010
Citation: Si, G.Y., Danner, A.J., Teng, J.H., Ang, S.S., Chew, A.B., Dogheche, E. (2010-08). Nanoscale arrays in lithium niobate fabricated by interference lithography and dry etching. International Journal of Nanoscience 9 (4) : 311-315. ScholarBank@NUS Repository. https://doi.org/10.1142/S0219581X10006867
Abstract: Channel waveguides have been fabricated in x-cut lithium niobate (LiNbO3) by proton exchange (PE) method and optically measured. The thickness and the optical constants of the thin PE layer were characterized using a prism coupling technique. The PE area was plasma etched and a 2.775-μm total etching depth was achieved. The measured average etching rate is 92.5 nm/min. One- and two-dimensional dense arrays of LiNbO3 nanostructures have also been fabricated by using interference lithography (IL) and inductively coupled plasma reactive ion etching (ICP-RIE) techniques. © 2010 World Scientific Publishing Company.
Source Title: International Journal of Nanoscience
URI: http://scholarbank.nus.edu.sg/handle/10635/83998
ISSN: 0219581X
DOI: 10.1142/S0219581X10006867
Appears in Collections:Staff Publications

Show full item record
Files in This Item:
There are no files associated with this item.

Page view(s)

40
checked on Sep 28, 2018

Google ScholarTM

Check

Altmetric


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.