Please use this identifier to cite or link to this item: https://doi.org/10.1149/1.3700470
Title: Multiple-gate In 0.53Ga 0.47As Channel n-MOSFETs with self-aligned Ni-InGaAs contacts
Authors: Zhang, X.
Guo, H.X.
Gong, X.
Guo, C.
Yeo, Y.-C. 
Issue Date: 2012
Source: Zhang, X., Guo, H.X., Gong, X., Guo, C., Yeo, Y.-C. (2012). Multiple-gate In 0.53Ga 0.47As Channel n-MOSFETs with self-aligned Ni-InGaAs contacts. ECS Transactions 45 (4) : 209-216. ScholarBank@NUS Repository. https://doi.org/10.1149/1.3700470
Abstract: Sub-100 nm multiple-gate In 0.53Ga 0.47As channel n-MOSFETs with self-aligned Ni-InGaAs contacts were demonstrated for the first time. With self-aligned Ni-InGaAs contacts formed on in-situ doped n ++ In 0.53Ga 0.47As source and drain, the device exhibits low series resistance of 364 Ω·μm. The multiple-gate device with 50 nm channel length has a drive current of more than 411 μA/μm at V D = 0.7 V and V G = 0.7 V. The device also shows a peak extrinsic transconductance G m of 590 μS/μm at V D = 0.5 V. ©The Electrochemical Society.
Source Title: ECS Transactions
URI: http://scholarbank.nus.edu.sg/handle/10635/83992
ISBN: 9781566779562
ISSN: 19385862
DOI: 10.1149/1.3700470
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