Please use this identifier to cite or link to this item: https://doi.org/10.1557/opl.2011.932
Title: Impact of rapid thermal annealing and hydrogenation on the doping concentration and carrier mobility in solid phase crystallized poly-Si thin Films
Authors: Kumar, A. 
Widenborg, P.I. 
Hidayat, H.
Qiu, Z.
Aberie, A.G.
Issue Date: 2012
Source: Kumar, A.,Widenborg, P.I.,Hidayat, H.,Qiu, Z.,Aberie, A.G. (2012). Impact of rapid thermal annealing and hydrogenation on the doping concentration and carrier mobility in solid phase crystallized poly-Si thin Films. Materials Research Society Symposium Proceedings 1321 : 173-178. ScholarBank@NUS Repository. https://doi.org/10.1557/opl.2011.932
Abstract: The effect of the rapid thermal annealing (RTA) and hydrogenation step on the electronic properties of the n + and p + solid phase crystallized (SPC) poly-crystalline silicon (poly-Si) thin films was investigated using Hall effect measurements and four-point-probe measurements. Both the RTA and hydrogenation step were found to affect the electronic properties of doped poly-Si thin films. The RTA step was found to have the largest impact on the dopant activation and majority carrier mobility of the p + SPC poly-Si thin films. A very high Hall mobility of 71 cm 2/Vs for n + poly-Si and 35 cm 2/Vs for p + poly-Si at the carrier concentration of 2×10 19 cm -3 and 4.5×10 19 cm -3, respectively, were obtained. © 2011 Materials Research Society.
Source Title: Materials Research Society Symposium Proceedings
URI: http://scholarbank.nus.edu.sg/handle/10635/83818
ISBN: 9781605112985
ISSN: 02729172
DOI: 10.1557/opl.2011.932
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