Please use this identifier to cite or link to this item: https://doi.org/10.1016/j.jmmm.2003.12.799
Title: Growth and magnetic properties of TiO2: Co anatase thin films by sputtering technique
Authors: Han, G.C.
Wu, Y.H. 
Tay, M.
Guo, Z.B.
Li, K.B.
Chong, C.T.
Keywords: Magnetic semiconductor
Sputtering
Thin film
TiO2: Co
Issue Date: May-2004
Citation: Han, G.C., Wu, Y.H., Tay, M., Guo, Z.B., Li, K.B., Chong, C.T. (2004-05). Growth and magnetic properties of TiO2: Co anatase thin films by sputtering technique. Journal of Magnetism and Magnetic Materials 272-276 (SUPPL. 1) : e1537-e1538. ScholarBank@NUS Repository. https://doi.org/10.1016/j.jmmm.2003.12.799
Abstract: TiO2:Co thin films were epitaxially grown in the form of single layer and digital alloy on LaAlO3 substrates by sputtering techniques. A wide range of saturation moment (ms) up to 1.51 μB/Co were obtained, depending on both Co content and deposition parameters. Surface morphology of the films seems to suggest the existence of Co clustering. However, higher ms value is not obtained from the films with the larger and denser clustering, implying that both charge carriers and Co clustering are contributing to the overall magnetism of the sample. © 2004 Elsevier B.V. All rights reserved.
Source Title: Journal of Magnetism and Magnetic Materials
URI: http://scholarbank.nus.edu.sg/handle/10635/83768
ISSN: 03048853
DOI: 10.1016/j.jmmm.2003.12.799
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