Please use this identifier to cite or link to this item:
|Title:||Growth and magnetic properties of TiO2: Co anatase thin films by sputtering technique|
|Citation:||Han, G.C., Wu, Y.H., Tay, M., Guo, Z.B., Li, K.B., Chong, C.T. (2004-05). Growth and magnetic properties of TiO2: Co anatase thin films by sputtering technique. Journal of Magnetism and Magnetic Materials 272-276 (SUPPL. 1) : e1537-e1538. ScholarBank@NUS Repository. https://doi.org/10.1016/j.jmmm.2003.12.799|
|Abstract:||TiO2:Co thin films were epitaxially grown in the form of single layer and digital alloy on LaAlO3 substrates by sputtering techniques. A wide range of saturation moment (ms) up to 1.51 μB/Co were obtained, depending on both Co content and deposition parameters. Surface morphology of the films seems to suggest the existence of Co clustering. However, higher ms value is not obtained from the films with the larger and denser clustering, implying that both charge carriers and Co clustering are contributing to the overall magnetism of the sample. © 2004 Elsevier B.V. All rights reserved.|
|Source Title:||Journal of Magnetism and Magnetic Materials|
|Appears in Collections:||Staff Publications|
Show full item record
Files in This Item:
There are no files associated with this item.
checked on Oct 11, 2018
WEB OF SCIENCETM
checked on Oct 2, 2018
checked on Sep 28, 2018
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.