Please use this identifier to cite or link to this item: https://doi.org/10.1016/j.jcrysgro.2005.12.051
Title: Formation of nanoimprinting mould through use of nanosphere lithography
Authors: Wang, B.
Zhao, W.
Chen, A. 
Chua, S.-J. 
Keywords: A1. Nanostructures
B2. Colloidal crystals
B2. Dielectric materials
B2. Nanoimprint lithography
B2. Nanosphere lithography
B2. Photonic crystals
Issue Date: 2-Feb-2006
Source: Wang, B., Zhao, W., Chen, A., Chua, S.-J. (2006-02-02). Formation of nanoimprinting mould through use of nanosphere lithography. Journal of Crystal Growth 288 (1) : 200-204. ScholarBank@NUS Repository. https://doi.org/10.1016/j.jcrysgro.2005.12.051
Abstract: Two-dimensional (2D) photonic crystal (PC) fabrication is generally carried out by electron beam lithography (EBL). This technique is very expensive and has a low throughput because it works serially. In this paper, we report an inexpensive, fast and simple nano-fabrication technique for creating nanostructures based on nanoimprint lithography (NIL) and nanosphere lithography (NSL) techniques. A monolayer of self-assembled polystyrene colloidal particle is used as a mask for dry etching of SiO2 to create periodic ordered nano-plates on glass. Then the nanopatterns are transferred by imprinting onto a polymer film or poly (methyl methacrylate) (PMMA)-coated Si substrate. Preliminary results show that this technique is a promising way to fabricate 2D photonic crystals. © 2005 Elsevier B.V. All rights reserved.
Source Title: Journal of Crystal Growth
URI: http://scholarbank.nus.edu.sg/handle/10635/83742
ISSN: 00220248
DOI: 10.1016/j.jcrysgro.2005.12.051
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