Please use this identifier to cite or link to this item: https://doi.org/10.1109/NANO.2005.1500660
Title: Fabrication of Ni80Fe20 antidot nanostructures using KrF lithography
Authors: Wang, C.C. 
Adeyeye, A.O. 
Singh, N.
Keywords: AMR
Antidot
Lithography
Permalloy
Phase shift
Issue Date: 2005
Source: Wang, C.C.,Adeyeye, A.O.,Singh, N. (2005). Fabrication of Ni80Fe20 antidot nanostructures using KrF lithography. 2005 5th IEEE Conference on Nanotechnology 2 : 95-98. ScholarBank@NUS Repository. https://doi.org/10.1109/NANO.2005.1500660
Abstract: We have fabricated arrays of nanometric ferromagnetic antidot structures over a very large area using KrF lithography at 248nm exposure wavelength. The antidot structure displays novel magnetic properties which are different from the continuous film. We have characterized in detail both the magnetic and transport properties. ©2005 IEEE.
Source Title: 2005 5th IEEE Conference on Nanotechnology
URI: http://scholarbank.nus.edu.sg/handle/10635/83725
ISBN: 0780391993
DOI: 10.1109/NANO.2005.1500660
Appears in Collections:Staff Publications

Show full item record
Files in This Item:
There are no files associated with this item.

Page view(s)

18
checked on Feb 17, 2018

Google ScholarTM

Check

Altmetric


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.