Please use this identifier to cite or link to this item: https://doi.org/10.1063/1.1689432
Title: Binding state and microstructure analyses of Co-doped TiO 2 thin film
Authors: Yao, X.F.
Zhou, T.J.
Gai, Y.X.
Chong, T.C. 
Wang, J.P.
Issue Date: 1-Jun-2004
Citation: Yao, X.F., Zhou, T.J., Gai, Y.X., Chong, T.C., Wang, J.P. (2004-06-01). Binding state and microstructure analyses of Co-doped TiO 2 thin film. Journal of Applied Physics 95 (11 II) : 7375-7377. ScholarBank@NUS Repository. https://doi.org/10.1063/1.1689432
Abstract: The binding state, microstructure and diffusion behavior of multilayered Co-doped TiO 2 thin film were investigated, using x-ray photoelectron spectroscopy and transmission electron microscopy (TEM). The magnetron sputtering method was used for the deposition of thin films on a LaAlO 3 (001) single crystal substrate, at room temperature. Postannealing treatment in an ultrahigh vacuum system was used for the diffusion of Co atoms into TiO 2. The results from TEM patterns show that the annealed films exhibit a polycrystalline rutile-TiO 2 phase.
Source Title: Journal of Applied Physics
URI: http://scholarbank.nus.edu.sg/handle/10635/83513
ISSN: 00218979
DOI: 10.1063/1.1689432
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