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|Title:||A new expandible ZnS-SiO2 liner stressor for n-channel FinFETs|
|Citation:||Ding, Y.,Tong, X.,Zhou, Q.,Liu, B.,Gyanathan, A.,Tong, Y.,Yeo, Y.-C. (2013). A new expandible ZnS-SiO2 liner stressor for n-channel FinFETs. Digest of Technical Papers - Symposium on VLSI Technology : T86-T87. ScholarBank@NUS Repository.|
|Abstract:||We report the first demonstration of a novel ZnS-SiO2 liner stressor to enhance drive current in Si n-channel FinFETs. ZnS-SiO2 expands during thermal anneal due to an increase in crystallite size. An expanded ZnS-SiO2 liner exerts high tensile stress in the N-FinFET channel and leads to a 30% ID,Sat improvement, with no compromise on short channel effects. This technology was realized on FinFETs with Si:C S/D stressors and Al-incorporated NiSi contacts. © 2013 JSAP.|
|Source Title:||Digest of Technical Papers - Symposium on VLSI Technology|
|Appears in Collections:||Staff Publications|
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