Please use this identifier to cite or link to this item: https://doi.org/10.1063/1.2430652
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dc.titleSc modified multiferroic BiFeO3 thin films prepared through a sol-gel process
dc.contributor.authorShannigrahi, S.R.
dc.contributor.authorHuang, A.
dc.contributor.authorChandrasekhar, N.
dc.contributor.authorTripathy, D.
dc.contributor.authorAdeyeye, A.O.
dc.date.accessioned2014-10-07T04:35:58Z
dc.date.available2014-10-07T04:35:58Z
dc.date.issued2007
dc.identifier.citationShannigrahi, S.R., Huang, A., Chandrasekhar, N., Tripathy, D., Adeyeye, A.O. (2007). Sc modified multiferroic BiFeO3 thin films prepared through a sol-gel process. Applied Physics Letters 90 (2) : -. ScholarBank@NUS Repository. https://doi.org/10.1063/1.2430652
dc.identifier.issn00036951
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/82994
dc.description.abstractMultiferroic thin films with the general formula Bi Fe1-x Scx O3 (x=0.0, 0.1, 0.3, and 0.5 mol %) (BFS) were synthesized on PtTiSi O2 Si substrates through a sol-gel deposition method. From the x-ray diffraction (XRD) analysis, it was observed that the unit cell volume increased upon Sc doping up to 0.3 mol %. Impure phase appeared for the BFS (Sc: 0.5 mol %) films. Leakage current, ferroelectric, and magnetic properties were also found to improve for Sc doping up to 0.3 mol %. Room temperature magnetic coercive field for in-plane orientation of films showed the lowest value for BFS (Sc: 0.3 mol %) films, which indicates that BFS (Sc: 0.3 mol %) films were more magnetically soft. Room temperature value of the magnetodielectric effect in the presence of magnetic field of 8 kOe was found to have maximum of 3.36% for the BFS (Sc: 0.3 mol %) films. From the x-ray photoelectron spectroscopy measurements, it was observed that the Fe has mixed valency states of 2+ and 3+. The ratio of Fe2+ and Fe3+ was found to decrease slightly in BFS (Sc: 0.3 mol %) films. The improved leakage current and M-H loops support the authors' observation. © 2007 American Institute of Physics.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1063/1.2430652
dc.sourceScopus
dc.typeArticle
dc.contributor.departmentELECTRICAL & COMPUTER ENGINEERING
dc.description.doi10.1063/1.2430652
dc.description.sourcetitleApplied Physics Letters
dc.description.volume90
dc.description.issue2
dc.description.page-
dc.description.codenAPPLA
dc.identifier.isiut000243582000053
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