Please use this identifier to cite or link to this item: https://doi.org/10.1021/nl4041516
Title: Profiling nanowire thermal resistance with a spatial resolution of nanometers
Authors: Liu, D.
Xie, R. 
Yang, N.
Li, B. 
Thong, J.T.L. 
Keywords: electron beam heating
nanoscale thermal transport
nanostructures
nanowires
Thermal conductance
thermal measurement
Issue Date: 12-Feb-2014
Citation: Liu, D., Xie, R., Yang, N., Li, B., Thong, J.T.L. (2014-02-12). Profiling nanowire thermal resistance with a spatial resolution of nanometers. Nano Letters 14 (2) : 806-812. ScholarBank@NUS Repository. https://doi.org/10.1021/nl4041516
Abstract: We report a new technique to profile the thermal resistance along a nanowire with a spatial resolution of better than 20 nm. Using this technique, we mapped the thermal conductivity along a Si0.7Ge 0.3/NiSi0.7Ge0.3 heterostructured nanowire. We also measured the interfacial thermal resistance (ITR) across the Si/NiSi 2 interface embedded in Si/NiSi2 heterostructured nanowires. The ITR does not change even for adjacent interfaces as close as ∼50 atomic layers. © 2014 American Chemical Society.
Source Title: Nano Letters
URI: http://scholarbank.nus.edu.sg/handle/10635/82936
ISSN: 15306984
DOI: 10.1021/nl4041516
Appears in Collections:Staff Publications

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