Please use this identifier to cite or link to this item:
|Title:||Profiling nanowire thermal resistance with a spatial resolution of nanometers|
|Keywords:||electron beam heating|
nanoscale thermal transport
|Citation:||Liu, D., Xie, R., Yang, N., Li, B., Thong, J.T.L. (2014-02-12). Profiling nanowire thermal resistance with a spatial resolution of nanometers. Nano Letters 14 (2) : 806-812. ScholarBank@NUS Repository. https://doi.org/10.1021/nl4041516|
|Abstract:||We report a new technique to profile the thermal resistance along a nanowire with a spatial resolution of better than 20 nm. Using this technique, we mapped the thermal conductivity along a Si0.7Ge 0.3/NiSi0.7Ge0.3 heterostructured nanowire. We also measured the interfacial thermal resistance (ITR) across the Si/NiSi 2 interface embedded in Si/NiSi2 heterostructured nanowires. The ITR does not change even for adjacent interfaces as close as ∼50 atomic layers. © 2014 American Chemical Society.|
|Source Title:||Nano Letters|
|Appears in Collections:||Staff Publications|
Show full item record
Files in This Item:
There are no files associated with this item.
checked on Jun 14, 2018
WEB OF SCIENCETM
checked on May 15, 2018
checked on May 25, 2018
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.