Please use this identifier to cite or link to this item: https://doi.org/10.1116/1.3557027
Title: Photonic crystal structures with ultrahigh aspect ratio in lithium niobate fabricated by focused ion beam milling
Authors: Si, G.
Danner, A.J. 
Teo, S.L.
Teo, E.J.
Teng, J.
Bettiol, A.A. 
Issue Date: Mar-2011
Source: Si, G., Danner, A.J., Teo, S.L., Teo, E.J., Teng, J., Bettiol, A.A. (2011-03). Photonic crystal structures with ultrahigh aspect ratio in lithium niobate fabricated by focused ion beam milling. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures 29 (2) : -. ScholarBank@NUS Repository. https://doi.org/10.1116/1.3557027
Abstract: Lithium niobate (LiNbO3, LN) is an important material which is widely applied in fabricating photonic and acoustic devices. However, it is difficult to either wet etch or dry etch LN due to the material's properties. Here, the authors report novel pattern fabrication based on LN using focused ion beam (FIB) milling. When an array of small holes is etched, a severe tapering problem is observed as is common, but by replacing the nanocylindrical hole array with a nanoring structure, the authors obtain photonic crystals with an aspect ratio of up to 50:1 (2 μm total etching depth and 40 nm gap aperture). Dense nanorod arrays with sub-30-nm ultrasmall gaps and more than 2.5 μm etching depth are also achieved with FIB milling. © 2011 American Vacuum Society.
Source Title: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
URI: http://scholarbank.nus.edu.sg/handle/10635/82897
ISSN: 10711023
DOI: 10.1116/1.3557027
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