Please use this identifier to cite or link to this item:
|Title:||Novel rare-earth dielectric interlayers for wide NMOS work-function tunability in Ni-FUSI gates|
|Keywords:||Fully silicided (FUSI)|
Work function engineering
|Citation:||Lim, A.E.-J., Lee, R.T.P., Samudra, G.S., Kwong, D.-L., Yeo, Y.-C. (2008). Novel rare-earth dielectric interlayers for wide NMOS work-function tunability in Ni-FUSI gates. IEEE Transactions on Electron Devices 55 (9) : 2370-2377. ScholarBank@NUS Repository. https://doi.org/10.1109/TED.2008.927391|
|Abstract:||A novel method of forming rare-Earth (RE)-based interlayers to engineer the work function (φm) of nickel fully silicided (Ni-FUSI) gates was investigated. An extensive range of RE metals comprising yttrium (Y), erbium (Er), dysprosium (Dy), terbium (Tb), gadolinium (Gd), ytterbium (Yb), or lanthanum (La) were sputtered to form RE-based interlayers (REIL's) on SiO2 dielectric. The interposed REIL enabled Si conduction band-edge (Ec) modulation (∼3.8-4.0 eV) of midgap NiSi φm. Band edge φm was retained even after a high-temperature annealing was conducted before FUSI. Ni-FUSI gate φm was tunable to ∼4.11-4.39 and ∼4.25-4.48 eV by reducing the interlayer thickness and varying the Ni silicide phase, respectively. Improved gate leakage and breakdown voltage were observed for the REIL-incorporated gate stacks. RE-O-Si bonding confirmed that the REIL's that were formed on SiO2 were thin RE silicates. The modulation of Ni-FUSI gate φm was attributed to the presence of interfacial RE-oxygen (RE-O) dipoles and correlated well with the calculated RE-O dipole magnitude. The application of La-based interlayer LaIL in a HfO2 dielectric stack was also investigated, and band-edge NiSi φm could be engineered by intentionally inserting the LaIL at the HfO2/SiO2 interface. © 2008 IEEE.|
|Source Title:||IEEE Transactions on Electron Devices|
|Appears in Collections:||Staff Publications|
Show full item record
Files in This Item:
There are no files associated with this item.
checked on Jul 17, 2018
WEB OF SCIENCETM
checked on Jun 20, 2018
checked on May 11, 2018
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.