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|Title:||Ferromagnetic nano-dot array fabricated by electron beam radiation induced nano-scale phase transition|
|Citation:||Zhou, T.J., Zhao, Y., Wang, J.P., Thong, J.T.L., Chong, T.C. (2002-05-15). Ferromagnetic nano-dot array fabricated by electron beam radiation induced nano-scale phase transition. Journal of Applied Physics 91 (10 I) : 6854-6856. ScholarBank@NUS Repository. https://doi.org/10.1063/1.1447523|
|Abstract:||We present a method of direct magnetic patterning of a nonmagnetic Co-C amorphous film by electron beam radiation induced nano-scale phase transition. Co-C alloy films with C concentration from 30 to 50 at% and thickness of 30-60 nm were prepared by alternately sputtering Co and C films onto C-buffered glass substrates. The films are amorphous and nonmagnetic with C concentration up to 40 at%. Due to their negative mixture entropy, as-deposited amorphous Co-C alloy films are metastable. Focused electron-beam irradiation causes localized phase segregation of the immiscible magnetic (Co-rich) and nonmagnetic (C-rich) phases. Ferromagnetic Co(C) nano-dot array was fabricated by subjecting the as-deposited Co 60C 40 films to electron beam radiation using a beam current of 16 nA, a beam energy of 20 keV and a dwell time of 5 s per dot. Magnetic force microscopy images and magnetic measurements confirm the formation of the ferromagnetic phase. The present single-step nanolithography eliminates the cumbersome traditional processes and is potentially a new and flexible alternative for fabricating patterned magnetic nanostructures for submicron magnetic devices. © 2002 American Institute of Physics.|
|Source Title:||Journal of Applied Physics|
|Appears in Collections:||Staff Publications|
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