Please use this identifier to cite or link to this item: https://doi.org/10.1088/0957-4484/22/38/385301
Title: Fabrication and characterization of bit-patterned media beyond 1.5 Tbit/in2
Authors: Yang, J.K.W.
Chen, Y. 
Huang, T.
Duan, H.
Thiyagarajah, N. 
Hui, H.K.
Leong, S.H.
Ng, V. 
Issue Date: 23-Sep-2011
Citation: Yang, J.K.W., Chen, Y., Huang, T., Duan, H., Thiyagarajah, N., Hui, H.K., Leong, S.H., Ng, V. (2011-09-23). Fabrication and characterization of bit-patterned media beyond 1.5 Tbit/in2. Nanotechnology 22 (38) : -. ScholarBank@NUS Repository. https://doi.org/10.1088/0957-4484/22/38/385301
Abstract: We fabricated bit-patterned media (BPM) at densities as high as 3.3 Tbit/in2 using a process consisting of high-resolution electron-beam lithography followed directly by magnetic film deposition. By avoiding pattern transfer processes such as etching and liftoff that inherently reduce pattern fidelity, the resolution of the final pattern was kept close to that of the lithographic step. Magnetic force microscopy (MFM) showed magnetic isolation of the patterned bits at 1.9 Tbit/in2, which was close to the resolution limit of the MFM. The method presented will enable studies on magnetic bits packed at ultra-high densities, and can be combined with other scalable patterning methods such as templated self-assembly and nanoimprint lithography for high-volume manufacturing. © 2011 IOP Publishing Ltd.
Source Title: Nanotechnology
URI: http://scholarbank.nus.edu.sg/handle/10635/82331
ISSN: 09574484
DOI: 10.1088/0957-4484/22/38/385301
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