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|Title:||Epitaxial growth of ferromagnetic Co:TiO2 thin films by co-sputtering|
|Citation:||Han, G.C., Wu, Y.H., Tay, M., Li, K.B., Guo, Z.B., Chong, T.C. (2004-01). Epitaxial growth of ferromagnetic Co:TiO2 thin films by co-sputtering. Journal of Magnetism and Magnetic Materials 268 (1-2) : 159-164. ScholarBank@NUS Repository. https://doi.org/10.1016/S0304-8853(03)00492-X|
|Abstract:||Epitaxial anatase Co:TiO2 thin films were grown on LaAlO 3 (0 0 1) substrates by co-sputtering method. Structural and compositional properties were measured as a function of deposition parameters to explore the growth mechanism of the anatase films. Epitaxial anatase structure can be obtained at deposition temperatures ranged from 500 °C to 750 °C. magnetization measurements show that the saturation magnetization (Ms) increases as deposition temperature increases. At 750 °C, Ms is about 1.13 μB/Co. X-ray diffraction results show that the sample has a superior anatase crystallinity with the full-width at half-maximum of 0.13 °. It was found that Ms is directly related with the crystallinity, i.e., Ms increases as the crystallinity of samples improves. © 2003 Elsevier B.V. All rights reserved.|
|Source Title:||Journal of Magnetism and Magnetic Materials|
|Appears in Collections:||Staff Publications|
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