Please use this identifier to cite or link to this item:
Title: Characterization of thin-film GaAs diodes grown on germanium-on-insulator on Si substrate
Authors: Xu, Z.
Yoon, S.F.
Yeo, Y.C. 
Chia, C.K.
Cheng, Y.B.
Dalapati, G.K.
Issue Date: 15-Feb-2012
Citation: Xu, Z., Yoon, S.F., Yeo, Y.C., Chia, C.K., Cheng, Y.B., Dalapati, G.K. (2012-02-15). Characterization of thin-film GaAs diodes grown on germanium-on-insulator on Si substrate. Journal of Applied Physics 111 (4) : -. ScholarBank@NUS Repository.
Abstract: In this study, we report the characterization of thin-film GaAs grown on germanium-on-insulator (GeOI) on Si substrate. A GaAs/GeOI diode with a 600 nm buffer layer showed a rectification of 1.0 × 10 7 at ± 2 V and had an electrical performance similar to that of the reference sample grown on GaAs substrate. We demonstrate two thin diodes (< 350 nm in thickness) that still showed high forward densities and rectification properties. The electrical performances of the diodes degraded as the diode active regions were grown closer to the GaAs/Ge interface due to the increase of defects propagating into the active regions. The experimental results were fitted with the thermionic emission equation and the Frenkel-Poole model. © 2012 American Institute of Physics.
Source Title: Journal of Applied Physics
ISSN: 00218979
DOI: 10.1063/1.3686182
Appears in Collections:Staff Publications

Show full item record
Files in This Item:
There are no files associated with this item.


checked on Mar 17, 2019


checked on Mar 6, 2019

Page view(s)

checked on Mar 2, 2019

Google ScholarTM



Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.