Please use this identifier to cite or link to this item: https://doi.org/10.1109/LED.2005.861025
Title: A fast measurement technique of MOSFET Id-Vg characteristics
Authors: Shen, C.
Li, M.-F. 
Wang, X.P.
Yeo, Y.-C. 
Kwong, D.-L.
Keywords: CMOSFETs
Reliability
Semiconductor device measurements
Trapping
Issue Date: Jan-2006
Citation: Shen, C., Li, M.-F., Wang, X.P., Yeo, Y.-C., Kwong, D.-L. (2006-01). A fast measurement technique of MOSFET Id-Vg characteristics. IEEE Electron Device Letters 27 (1) : 55-57. ScholarBank@NUS Repository. https://doi.org/10.1109/LED.2005.861025
Abstract: In this letter, we developed an improved ultrafast measurement method for threshold voltage Vth measurement of MOSFETs. We demonstrate Id-Vg curve measurement within 1 μs to extract the threshold voltage of MOSFET. Errors arising from MOSFET parasitics and measurement setup are analyzed quantatatively. The ultrafast Vth measurement is highly needed in the investigation of gate dielectric charge trapping effect when traps with short detrapping time constants are present. Application in charge trapping measurement on HfO2 gate dielectric is demonstrated. © 2005 IEEE.
Source Title: IEEE Electron Device Letters
URI: http://scholarbank.nus.edu.sg/handle/10635/81867
ISSN: 07413106
DOI: 10.1109/LED.2005.861025
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