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|Title:||SCREAM micromachined high aspect ratio low-G microaccelerometer|
|Authors:||Tay, Francis E.H. |
|Citation:||Tay, Francis E.H.,Logeeswaran, V.J.,Liang, Y.C. (2000). SCREAM micromachined high aspect ratio low-G microaccelerometer. Proceedings of SPIE - The International Society for Optical Engineering 4019 : 344-353. ScholarBank@NUS Repository.|
|Abstract:||A low-cost open loop differential capacitive accelerometer with a resolution of 5 mg (1 g = 9.81 m/s2) and high sensitivity (800 mV/g) has been designed with a full measurement range of ±2 g. By using the single crystal reactive ion etching and metallization (SCREAM) process, beams with high aspect ratio, small air gap for large capacitance variation and low parasitic capacitance have been attained. The fabricated microaccelerometer also offers high voltage output and it has successfully survived a shock of 1000 g. The effects of electrostatic spring constant on the natural frequency and sensitivity of the accelerometer have been thoroughly discussed, and obliqueness of the beam cross-section has also been taken into consideration. The ratiometric error for this system has been optimized and is well below 2% with a cross axis sensitivity of less than 3%. The operating voltage is 5 V DC. The construction is based on a hybrid two-chip design and the sensing element is wire bonded to a CMOS ASIC.|
|Source Title:||Proceedings of SPIE - The International Society for Optical Engineering|
|Appears in Collections:||Staff Publications|
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