Hot carrier degradation study in PMOSFET using gated-diode drain current and charge pumping measurements

Abstract

The forward gated-diode drain current characterized at low drain voltages and charge pumping current measurements are applied to pMOSFET's for investigating hot-carrier induced defects in the device. A linear relationship between the post-stress forward gated-diode drain current peaks and the corresponding charge pumping current peaks is obtained. Trapping of negative charge and generation of interface traps alter stress may be deduced from the gated-diode drain current characteristics. Logarithmic time degradation is observed from measurement of the increase in the forward gated-diode drain current peaks after stress.