Please use this identifier to cite or link to this item:
|Title:||Structural characterization of rapid thermally oxidized silicon-germanium-carbon alloy films|
|Authors:||Choi, W.K. |
Rapid thermally oxidized film
Silicon-germanium-carbon alloy films
X-ray diffraction spectroscopy
|Citation:||Choi, W.K.,Bera, L.K.,Chen, J.H.,Feng, W.,Pey, K.L.,Yoong, H.,Mi, J.,Zhang, F.,Yang, C.Y. (2000-06-01). Structural characterization of rapid thermally oxidized silicon-germanium-carbon alloy films. Materials Science and Engineering B: Solid-State Materials for Advanced Technology 75 (2-3) : 184-186. ScholarBank@NUS Repository.|
|Abstract:||The properties of as-prepared and rapidly thermally oxidized Si1-x-yGexCy alloy films have been examined using infrared, X-ray diffraction, and Raman techniques. The structural properties of the oxidized Si1-x-yGexCy film depend on the type of strain of the as-prepared film. For compressive or fully compensated films, the oxidation process drastically reduces the carbon content such that the oxidized film compositions resemble that of Si1-xGex films. For tensile films, two broad layers co-exist in the oxidized films, one with a carbon content higher and the other lower than that required for full strain compensation. © 2000 Elsevier Science S.A. All rights reserved.|
|Source Title:||Materials Science and Engineering B: Solid-State Materials for Advanced Technology|
|Appears in Collections:||Staff Publications|
Show full item record
Files in This Item:
There are no files associated with this item.
checked on Feb 8, 2019
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.