Please use this identifier to cite or link to this item: http://scholarbank.nus.edu.sg/handle/10635/81225
Title: Structural characterization of rapid thermally oxidized silicon-germanium-carbon alloy films
Authors: Choi, W.K. 
Bera, L.K. 
Chen, J.H. 
Feng, W.
Pey, K.L. 
Yoong, H.
Mi, J.
Zhang, F.
Yang, C.Y.
Keywords: Raman spectroscopy
Rapid thermally oxidized film
Silicon-germanium-carbon alloy films
X-ray diffraction spectroscopy
Issue Date: 1-Jun-2000
Source: Choi, W.K.,Bera, L.K.,Chen, J.H.,Feng, W.,Pey, K.L.,Yoong, H.,Mi, J.,Zhang, F.,Yang, C.Y. (2000-06-01). Structural characterization of rapid thermally oxidized silicon-germanium-carbon alloy films. Materials Science and Engineering B: Solid-State Materials for Advanced Technology 75 (2-3) : 184-186. ScholarBank@NUS Repository.
Abstract: The properties of as-prepared and rapidly thermally oxidized Si1-x-yGexCy alloy films have been examined using infrared, X-ray diffraction, and Raman techniques. The structural properties of the oxidized Si1-x-yGexCy film depend on the type of strain of the as-prepared film. For compressive or fully compensated films, the oxidation process drastically reduces the carbon content such that the oxidized film compositions resemble that of Si1-xGex films. For tensile films, two broad layers co-exist in the oxidized films, one with a carbon content higher and the other lower than that required for full strain compensation. © 2000 Elsevier Science S.A. All rights reserved.
Source Title: Materials Science and Engineering B: Solid-State Materials for Advanced Technology
URI: http://scholarbank.nus.edu.sg/handle/10635/81225
ISSN: 09215107
Appears in Collections:Staff Publications

Show full item record
Files in This Item:
There are no files associated with this item.

Page view(s)

24
checked on Feb 17, 2018

Google ScholarTM

Check


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.