Please use this identifier to cite or link to this item: https://scholarbank.nus.edu.sg/handle/10635/80800
DC FieldValue
dc.titleNew electron and hole traps in GaAsP alloy
dc.contributor.authorTeo, K.L.
dc.contributor.authorLi, M.F.
dc.contributor.authorGoo, C.H.
dc.contributor.authorLau, W.S.
dc.contributor.authorLim, Y.T.
dc.date.accessioned2014-10-07T03:01:26Z
dc.date.available2014-10-07T03:01:26Z
dc.date.issued1997
dc.identifier.citationTeo, K.L.,Li, M.F.,Goo, C.H.,Lau, W.S.,Lim, Y.T. (1997). New electron and hole traps in GaAsP alloy. International Journal of Electronics 83 (1) : 29-35. ScholarBank@NUS Repository.
dc.identifier.issn00207217
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/80800
dc.description.abstractTwo electron traps and a hole trap have been observed in vapour phase epitaxial GaAs0.66P0.4 materials by deep level transient spectroscopy. The dominant electron trap A, which has never previously been reported, has a thermal emission activation energy of Ee A = 0.83 eV and an abnormally large capture activation energy Ec A = 0.73 eV. Hole trap C with thermal emission activation energy of Ee C = 0.65 eV is also new and different from previous reports. A critical comparison of traps reported in this work with traps reported in the existing literature is also made. © 1997 Taylor & Francis Ltd.
dc.sourceScopus
dc.typeArticle
dc.contributor.departmentELECTRICAL ENGINEERING
dc.description.sourcetitleInternational Journal of Electronics
dc.description.volume83
dc.description.issue1
dc.description.page29-35
dc.description.codenIJELA
dc.identifier.isiutNOT_IN_WOS
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