Please use this identifier to cite or link to this item:
https://scholarbank.nus.edu.sg/handle/10635/80800
DC Field | Value | |
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dc.title | New electron and hole traps in GaAsP alloy | |
dc.contributor.author | Teo, K.L. | |
dc.contributor.author | Li, M.F. | |
dc.contributor.author | Goo, C.H. | |
dc.contributor.author | Lau, W.S. | |
dc.contributor.author | Lim, Y.T. | |
dc.date.accessioned | 2014-10-07T03:01:26Z | |
dc.date.available | 2014-10-07T03:01:26Z | |
dc.date.issued | 1997 | |
dc.identifier.citation | Teo, K.L.,Li, M.F.,Goo, C.H.,Lau, W.S.,Lim, Y.T. (1997). New electron and hole traps in GaAsP alloy. International Journal of Electronics 83 (1) : 29-35. ScholarBank@NUS Repository. | |
dc.identifier.issn | 00207217 | |
dc.identifier.uri | http://scholarbank.nus.edu.sg/handle/10635/80800 | |
dc.description.abstract | Two electron traps and a hole trap have been observed in vapour phase epitaxial GaAs0.66P0.4 materials by deep level transient spectroscopy. The dominant electron trap A, which has never previously been reported, has a thermal emission activation energy of Ee A = 0.83 eV and an abnormally large capture activation energy Ec A = 0.73 eV. Hole trap C with thermal emission activation energy of Ee C = 0.65 eV is also new and different from previous reports. A critical comparison of traps reported in this work with traps reported in the existing literature is also made. © 1997 Taylor & Francis Ltd. | |
dc.source | Scopus | |
dc.type | Article | |
dc.contributor.department | ELECTRICAL ENGINEERING | |
dc.description.sourcetitle | International Journal of Electronics | |
dc.description.volume | 83 | |
dc.description.issue | 1 | |
dc.description.page | 29-35 | |
dc.description.coden | IJELA | |
dc.identifier.isiut | NOT_IN_WOS | |
Appears in Collections: | Staff Publications |
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