Please use this identifier to cite or link to this item: http://scholarbank.nus.edu.sg/handle/10635/80187
Title: Fabrication of low loss silicon waveguides by ion irradiation and electrochemical etching
Authors: XIONG BOQIAN
Keywords: silicon photonics, silicon waveguide, ion beam irradiation, electrochemical etching, porous silicon, Bragg waveguide
Issue Date: 23-Jan-2014
Citation: XIONG BOQIAN (2014-01-23). Fabrication of low loss silicon waveguides by ion irradiation and electrochemical etching. ScholarBank@NUS Repository.
Abstract: The aim of this thesis is to report novel methods that have been developed to fabricate different kinds of low loss silicon, or porous silicon-based waveguides, including straight waveguides, curved waveguides, three-dimensional integration of silicon on oxidized porous-silicon (SOPS) waveguides and all-silicon single-mode Bragg cladding rib waveguides. The two major process steps used for fabrication of such structures are ion irradiation and electrical anodization. For each kind of waveguide, optical characterization and further studies of the loss mechanisms are presented and discussed.
URI: http://scholarbank.nus.edu.sg/handle/10635/80187
Appears in Collections:Ph.D Theses (Open)

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